Made in UK, 英國EM Resist Ltd出品的光刻膠（1%-17% PMMA、SML系列電子束曝光阻劑），PMMA是常用的普通正阻劑；SML系列阻劑是高分辨率高深寬比的正阻劑。的SML正阻劑特點：無需鄰近效應校正，低加速電壓下也能使用，可提高EBL設備能力并制作出傳統PMMA做不出來的新穎微納器件，特別適合科研應用；有SML50、SML100、SML300、SML600、SML1000、SML2000等系列型號（數字表示光刻膠涂布厚度）。

[資料]PMMA (Polymethyl Methacrylate；聚甲基丙烯酸甲酯；positive tone, polymer chain scission type for Electron beam, DUV, x-ray and multi-level lithography) is a widely used, versatile resist that is used for many imaging (and non-imaging) micro-electronic applications as well as a protective coating for wafer thinning, a bonding adhesive and as a sacrificial layer, but is commonly used as a high resolution positive resist for direct write with e-beam. EM Resist Ltd specialises in electron beam lithography resists and applications. We develop and manufacture electron beam resists in a purpose built clean-room facility to ensure maximum quality and performance.Our products and expertise are the result of many years research by experienced physicists and material scientists in both academia and industry. EM Resist products are provided in a clean room compatible box, if you need Material Safety Data Sheets, Process Information, Example design files and other useful information, please contact with our Chinese Distributor(www.tansi.com.cn).

PMMA Product Options. First,select which solvent(Anisole or Chlorobenzene) best suits your application. Second,select which solid percentage(1%-17%, 20nm-3500nm) of thickness required.Third,choose a volume to suit your usage needs.